Unveiling frequency-dependent electrical behaviour in Cu2O/TiO2 heterojunctions via capacitance and impedance spectroscopy
Document Type
Article
Publication Title
Materials Research Express
Abstract
This study investigates the AC electrical properties of Cu2O/TiO2 heterojunctions deposited via reactive DC magnetron sputtering, with a focus on the role of interfacial dynamics and post-deposition annealing. Mott-Schottky analysis revealed built-in potentials ranging from 0.45 V to 1.92 V, with carrier concentrations between 1.43 × 1016 and 9.93 × 1016 cm−3, influenced by the annealing temperature. The depletion width was estimated to be roughly 395 nm in the 150 °C annealed samples, and the TiO2 layer was more depleted across all samples. Dielectric constant (ϵ′) values decreased from approximately 85 to about 10 as frequency increased from 1 kHz to 1 MHz, while tangent loss also diminished significantly, indicating reduced dipolar and space-charge polarization. The imaginary part of the dielectric constant (ϵ″) confirmed strong interfacial polarization at low frequencies. AC conductivity rose with frequency, supporting a thermally activated hopping conduction mechanism. Impedance spectroscopy, modelled with an R(CR)(QR)(CR) circuit, exhibited multiple relaxation behaviors, and incorporating a constant phase element (CPE) accounted for non-ideal dielectric effects caused by surface inhomogeneity. Rapid thermal annealing resulted in a decrease in series resistance, from 844 Ω at room temperature to 802 Ω at 150 °C. Annealing at 150 °C produced optimal outcomes, reducing interface losses and enhancing charge transport. These findings underscore the tunability and potential of Cu2O/TiO2 heterostructures for optoelectronic applications such as photodetectors and solar cells.
DOI
10.1088/2053-1591/ae07a6
Publication Date
9-1-2025
Recommended Citation
Jagadish, K. A. and Kekuda, Dhananjaya, "Unveiling frequency-dependent electrical behaviour in Cu2O/TiO2 heterojunctions via capacitance and impedance spectroscopy" (2025). Open Access archive. 12676.
https://impressions.manipal.edu/open-access-archive/12676