Mole Fraction Dependent Passive Voltage Amplification in FE-DE Heterostructure
Document Type
Article
Publication Title
Electronic Materials
Abstract
This paper explores ferroelectric–dielectric heterostructures comprising a ferroelectric oxide (Lead Zirconium Titanate (Formula presented.)) with a varying mole fraction and a fixed dielectric oxide (Silicon dioxide (Formula presented.)). The study aims to enhance capacitance, optimize voltage amplification, and achieve stable negative capacitance. An isolated ferroelectric capacitor is examined by varying mole fractions of ferroelectric oxide. The negative capacitance in isolated ferroelectric capacitor is highly unstable in nature. The instability problem is fixed and the overall capacitance of the heterostructure is raised while the negative capacitance is stabilized by connecting a dielectric oxide in series with the ferroelectric capacitor. (Formula presented.) is utilized as the ferroelectric oxide, with mole fractions (Formula presented.). Among the investigated mole fractions, ferroelectric oxide with (Formula presented.) offers the maximum voltage amplification and improved capacitance because its capacitance closely matches the dielectric capacitance. Also, dynamic response and temperature analysis of heterostructure are studied further.
DOI
10.3390/electronicmat6030011
Publication Date
9-1-2025
Recommended Citation
Chamarahalli Manjunatha, Archana; Suresh, Pratheeksha; Bhat, Akshatha; and Mishra, Vikash, "Mole Fraction Dependent Passive Voltage Amplification in FE-DE Heterostructure" (2025). Open Access archive. 12706.
https://impressions.manipal.edu/open-access-archive/12706